SEMI International Standards
Standards Locale: Japan
Committee: Micropatterning
Place of Meeting: SEMI Japan, Tokyo, Japan
Date of Meeting: 04/09/2013
Meeting End Date: 04/09/2013
Recording SEMI Standards Staff: Naoko Tejima
CER Posted to Web: 04/22/2013
Leadership Changes
Group | Previous Leader | New Leader |
| JA Micropatterning Committee Co-Chairs | Iwao Higashikawa (Toshiba) | Open |
TC Chapter Structure Changes
None.
Ballot Results
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
| 5535 | Reapproval of SEMI P35-1106, Terminology for Microlithography Metrology | Passed as balloted |  5535_Ballot_Report_r0.0.pdf |
| 5536 | Reapproval of P36-1108, Guide for Magnification Reference for Critical Dimension Measurement for Scanning Electron Microscopes (CD-SEMS) | Passed as balloted |  5536_Ballot_Report_r0.0.pdf |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
None.
Authorized Ballots
# | When | SC/TF/WG | Details |
| 5537 | the earliest possible cycle | 5-year-review Task Force | Line Item Revision to SEMI P23-0200 (Reapproved 1107), Guidelines for Programmed Defect Masks and Benchmark Procedures for Sensitivity Analysis of Mask Defect Inspection Systems |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
SEMI Japan Standards Summer 2013 Meetings
Wednesday, August 28, 2013 15:30-17:30, SEMI Japan, Ichigaya, Tokyo
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