SEMI International Standards
Standards Locale: North America
Committee: Microlithography
Place of Meeting: San Jose Convention Center
Date of Meeting: 02/28/2013
Meeting End Date: 02/28/2013
Recording SEMI Standards Staff: Michael Tran
CER Posted to Web: 03/14/2013
Leadership Changes
Group | Previous Leader | New Leader |
Overlay Metrology Specifications TF | Rick Silver (NIST) | (Disbanded) |
TC Chapter Structure Changes
None.
Ballot Results
Passed ballots and line items will be submitted to the ISC Audit & Review Subcommittee for procedural review.
Failed ballots and line items were returned to the originating task forces for re-work and re-balloting.
Document # | Document Title | Committee Action | A&R Forms for Approved Ballots |
5048 | Line-Item Revisions to SEMI P37-1109, Specification for Extreme Ultraviolet Lithography Mask Substrates | Line Items 1 and 2, passed with editorial changes |  |
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
--- | SNARF | Mask Orders TF | Revision of SEMI P10-1112, Specification of Data Structures for Photomask Orders |
Authorized Ballots
# | When | SC/TF/WG | Details |
--- | Cycle 1-2015 | Mask Orders TF | Revision of SEMI P10-1112, Specification of Data Structures for Photomask Orders |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
The next N.A. Microlithography committee meeting will be scheduled in conjunction with SEMICON West 2013. Meeting details, schedule, and travel information will be updated at the SEMI Standards Calendar of Events: http://www.semi.org/en/Standards/CalendarEvents
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