SEMI International Standards
Standards Locale: Japan
Committee: Silicon Wafer
Place of Meeting: SEMI Japan, Tokyo, Japan
Date of Meeting: 09/21/2011
Meeting End Date: 09/21/2011
Recording SEMI Standards Staff: Akiko Yamamoto
CER Posted to Web: 10/04/2011
Leadership Changes
Group | Previous Leader | New Leader |
| International Test Method Task Force | Masaharu Watanabe (NuFlare Technology) | Ryuji Takeda (Covalent Silicon) |
| International Advanced Surface Inspection Task | -- | Yusuke Tamaki (ATMI Japan) |
TC Chapter Structure Changes
None.
Ballot Results
None.
Ratification Ballot Results
None.
Activities Approved by the GCS between meetings of TC Chapter meeting
None.
Authorized Activities
# | Type | SC/TF/WG | Details |
| 5321 | SNARF | Int'l Polished Wafers Task Force | Revision to SEMI M24-0307: Specification for Polished Monocrystalline Silicon Premium Wafers |
| 5322 | SNARF | Int'l Epitaxial Wafers Task Force | Revision to SEMI M61-0307, Specification for Silicon Epitaxial Wafers with Buried Layers |
Note: SNARFs and TFOFs are available for review on the SEMI Web site at:
http://downloads.semi.org/web/wstdsbal.nsf/TFOFSNARF
Authorized Ballots
# | When | SC/TF/WG | Details |
| 5321 | C7-11 | Int'l Polished Wafers Task Force | Revision to SEMI M24-0307: Specification for Polished Monocrystalline Silicon Premium Wafers |
| 5322 | C7-11 | Int'l Epitaxial Wafers Task Force | Revision to SEMI M61-0307, Specification for Silicon Epitaxial Wafers with Buried Layers |
SNARF(s) Granted a One-Year Extension
None.
SNARF(s) Cancelled
None.
Standard(s) to receive Inactive Status
None.
Special Announcements of the Committee (Workshops, Programs, etc.)
SEMI Standards Technical Education Program on 450 mm Wafer will be held co-hosted by the Japan PIC Committee and the Japan Silicon Wafer Committee on Friday, December 9, 13:00-16:45 during SEMICON Japan 2011.
Next Meeting
SEMICON Japan 2010
Thursday, December 8, 2011 13:00-
Makuhari Messe, Chiba, Japan
|