SEMI International Standards
Standards Locale: Japan
Committee: Silicon Wafer
Place of Meeting: SEMI Japan/ OVTCCM
Date of Meeting: 04/17/2026
Meeting End Date: 04/17/2026
Recording SEMI Standards Staff: Akiko Yoshida
CER Posted to Web: 05/01/2026
Leadership Changes
WG/TF/SC/TC Name | Previous Leader | New Leader |
| None |  | |
TC Chapter Structure Changes
Previous WG/TF/SC Name | New WG/TF/SC Name or Status Change |
| None | |
Ballot Results
Document # | Document Title | TC Chapter Action | A&R Forms for Approved Ballots |
| 6570D | New Standard: Guide for Measuring Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by a Laser-Scattering Tomography Technique | Passed with editorial changes |  6570D_Ballot Review.pdf |
Note 1: Passed ballots and line items will be submitted to the ISC Audit & Review Subcommittee for procedural review.
Note 2: Failed ballots and line items were returned to the originating task forces for re-work and re-balloting or abandoning.
Ratification Ballot Results
Document # | Document Title | ISC A&R Action | A&R Forms |
| None | | | |
Note 1: Passed Ratification ballots will be submitted to SEMI publication for final processing.
Note 2: Failed Ratification ballots were returned to the originating task forces for re-work and re-balloting or abandoning.
Activities Approved by the GCS between meetings of TC Chapter meeting
# | Type | SC/TF/WG | Details |
| None | | | |
Authorized Activities
Listing of all revised or new SNARF(s) approved by the Originating TC Chapter.
# | Type | SC/TF/WG | Details |
| None | | | |
Note 1: SNARFs and TFOFs are available for review on the SEMI Web site at:
http://downloads.semi.org/web/wstdsbal.nsf/TFOFSNARF
Authorized Ballots
Listing of documents authorized by the Originating TC Chapter for Letter Ballot.
SNARF(s) Granted a One-Year Extension
# | TF | Title | Expiration Date |
| 6570 | Int’l Test Method TF | New Standard: Guide for Measuring Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by a Laser-Scattering Tomography Technique | 2027/04/19 |
| 6702 | Int’l Test Method TF | Revision of M60: TEST METHOD FOR TIME DEPENDENT DIELECTRIC BREAKDOWN CHARACTERISTICS OF Amorphous SiO2 FILMS FOR Silicon WAFER EVALUATION | 2027/01/15 |
SNARF(s) Cancelled
# | TF | Title |
| 7438 | Int’l Test Method TF | Line-item Revision to SEMI M95-0925, TEST METHOD FOR NET CARRIER DENSITY AND RESISTIVITY OF SILICON EPITAXIAL LAYER BY CAPACITANCE-VOLTAGE MEASUREMENTS WITH AN EVAPORATED METAL SCHOTTKY DIODE |
Standard(s) to receive Inactive Status
Standard Designation | Title |
| None | |
Special Announcements of the Committee (Workshops, Programs, etc.)
None.
Next Meeting
The next meeting is scheduled for Friday, August 28, 2026 1:00 PM to 4:00 PM JST at SEMI Japan, Tokyo, Japan and via OVTCCM (Hybrid).
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